Ion implantation induced defects in epitaxial 4H–SiC

Author:

Hallén A,Henry A,Pellegrino P,Svensson B.G,Åberg D

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Cited by 51 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Low to Medium Dose Room and Elevated Temperature Implants in 4H-SiC Devices;2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-11-27

2. Proton Irradiation‐Induced Displacement Damage in 650 V Si and SiC Power Diodes;physica status solidi (a);2023-10-15

3. Electrical deterioration of 4H-SiC MOS capacitors due to bulk and interface traps induced by proton irradiation;Microelectronics Reliability;2023-03

4. Radiation Hardness of Silicon Carbide upon High-Temperature Electron and Proton Irradiation;Materials;2021-08-31

5. Ni Schottky barrier on heavily doped phosphorous implanted 4H-SiC;Journal of Physics D: Applied Physics;2021-08-20

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