A new method of measuring neutral radicals by mass spectrometry
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Instrumentation
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2. Improve silane utilization for silicon thin film deposition at high rate;Thin Solid Films;2011-11
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4. Mass spectroscopic measuring of SiCln (n = 0–2) radicals in SiCl4 RF glow discharge plasma;Journal of Materials Science;2007-12
5. Reply to “Comment on ‘Effects of hydrogen dilution on the deposition process of nano-crystalline silicon film by SiCl4/H2 plasma’”;Journal of Physics D: Applied Physics;2007-04-19
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