A simple optical system for miniature spindle runout monitoring

Author:

Lee ChaBumORCID,Zhao Rui,Jeon Seongkyul

Funder

NSF

Center for Manufacturing Research

Publisher

Elsevier BV

Subject

Applied Mathematics,Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation

Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Wafer Edge Metrology and Inspection Technique Using Curved-Edge Diffractive Fringe Pattern Analysis;Journal of Manufacturing Science and Engineering;2024-06-10

2. Characterization of Tool Eccentricity of a CNC Milling Machine Using High Speed Imaging;2023 16th International Conference on Sensing Technology (ICST);2023-12-17

3. Curved-edge diffractive fringe pattern analysis for wafer edge metrology and inspection;Metrology, Inspection, and Process Control XXXVII;2023-04-27

4. A machine vision–based radial circular runout measurement method;The International Journal of Advanced Manufacturing Technology;2023-04-11

5. An optical method based auto-collimation for measuring five degrees of freedom error motions of rotary axis;Review of Scientific Instruments;2022-12-01

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