Dependence of surface smoothing, sputtering and etching phenomena on cluster ion dosage-Reference-Cited by-同舟云学术

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Dependence of surface smoothing, sputtering and etching phenomena on cluster ion dosage

Published:2002-11 Issue:3-4 Volume:196 Page:268-274
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Song Jae-Hoon,Choi Duck-Kyun,Choi Won-Kook

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference17 articles.

1. Applications of gas cluster ion beams for materials processing

2. Decaborane (B/sub 10/H/sub 14/) ion implantation technology for sub-0.1-μm PMOSFET's

3. Reactive accelerated cluster erosion (RACE) by ionized cluster beams

4. Larger cluster ion impact phenomena

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface Smoothing by Gas Cluster Ion Beam Using Decreasing Three-Step Energy Treatment;Coatings;2023-05-17

2. Surface Processing by Polyatomic Cluster Ion Beams;e-Journal of Surface Science and Nanotechnology;2011

3. Nanometer-Scale Objects of Deposition and Sputtering;J SURF INVESTIG;2008

4. Investigation of nanoprotrusion induced by isolated impact of Ar cluster ion beam on Si and GaAs crystal;Thin Solid Films;2005-03

5. Nanohillock formation by impact of small low-energy clusters with surfaces;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-06

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