Secondary electron emission and surface potential of SiO2 film surface by negative ion bombardment-Reference-Cited by-同舟云学术

Secondary electron emission and surface potential of SiO2 film surface by negative ion bombardment

Published:1998-05 Issue:1-4 Volume:141 Page:645-651
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Tsuji Hiroshi,Gotoh Yasuhito,Ishikawa Junzo

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference11 articles.

3. H. Tsuji, Y. Toyota, J. Ishikawa, S. Sakai, et al., Ion Implantation Technology-94, Elsevier, Amsterdam, 1995, pp. 612–515

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