A rate-equation model for the growth of metallic thin films in ion beam assisted deposition
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference30 articles.
1. The role of transient ion‐induced defects in ion beam‐assisted growth
2. Suppression of three-dimensional island nucleation during GaAs growth on Si(100)
3. Low energy ion assist during deposition — an effective tool for controlling thin film microstructure
4. Effect of energetic particles on island formation in sputter deposition of Pt on Pt(111)
5. Simulations of energetic beam deposition: From picoseconds to seconds
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