Reduction of the tensile stress in CoSi2 films by pre-deposition carbon ion implantation-Reference-Cited by-同舟云学术

Reduction of the tensile stress in CoSi2 films by pre-deposition carbon ion implantation

Published:2002-09 Issue:3 Volume:194 Page:289-296
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Liu J.F.,Feng J.Y.,Li W.Z.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference27 articles.

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