Reactive ion etching of glasses: Composition dependence-Reference-Cited by-同舟云学术

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Reactive ion etching of glasses: Composition dependence

Published:2003-05 Issue:1 Volume:207 Page:21-27
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Metwalli EzzEldin,Pantano Carlo G.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference18 articles.

1. Encapsulated micro mechanical sensors

2. Multiple-layer blank structure for phase-shifting mask fabrication

3. Etching Mechanism of Vitreous Silicon Dioxide in HF-Based Solutions

4. Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

5. Etching in microsystem technology;Köhler,1999

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