Proximity gettering of copper in separation-by-implanted-oxygen structures

Author:

Yankov R.A.,Hatzopoulos N.,Skorupa W.,Danilin A.B.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Gettering in silicon-on-insulator wafers: experimental studies and modelling;Semiconductor Science and Technology;2005-04-15

2. High efficiency gettering of Au in Si(111) by MeV C implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-06

3. Nickel precipitation at nanocavities in separation by implantation of oxygen;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000

4. Gettering of Cu by microcavities in bonded/ion-cut silicon-on-insulator and separation by implantation of oxygen;Journal of Applied Physics;1999-10-15

5. Calibrated Contamination Spiking Method for Silicon Wafers in the 1010 – 1012   Atom / cm2 Range;Journal of The Electrochemical Society;1999-06-01

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