Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment-Reference-Cited by-同舟云学术

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Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment

Published:2000-10 Issue:3-4 Volume:170 Page:375-384
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Mohnjuk A.A,Gusev I.V,Belevsky V.P

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference46 articles.

1. Modification of thin film properties by ion bombardment during deposition

2. Developments in ionization assisted processes

3. Ion-assisted deposition and metastable structures

4. Particle bombardment effects on thin‐film deposition: A review

5. Ion plating as an industrial manufacturing method

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1. Influence of surface smoothing on normal grain growth in Al films deposited from ionized vapor;Vacuum;2016-07

2. Grain growth in thin Al films during deposition from partially ionized vapor;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2016-07

3. Diagnostic system for plasma/surface energy transfer characterization;Review of Scientific Instruments;2006-03

4. Durability of nanosized oxygen-barrier coatings on polymers;Progress in Materials Science;2003-01

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