1. Dry development of ion beam exposed PMMA resist
2. Anonymous, 1981. Solid State Technol. October 1981, 100
3. Anonymous, 1982, Reactive Ion Beam Etching (RIBE) of Polyimides, Application Note #206–82 (Commonwealth Scientific Corp., Alexandria, VA).
4. GaAs and GaAlAs Equi-Rate Etching Using a New Reactive Ion Beam Etching System
5. Barker, R.A., T.M. Mayer and W.C. Pearson, 1982, Proc. Electrochem. Soc. Spring Meeting, Vol. 82–1, Extended Abstract 276, p. 452.