Growth of GaxIn1−xAs/InP thin layer structures by chemical beam epitaxy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference12 articles.
1. R.T.H. Rongen, M.R. Leys, P.J. van Hall, C.M. van Es, H. Vonk and J.H. Wolter, J. Electron. Mater., submitted.
2. OMVPE growth of GaInAs/InP and GaInAs/GaInAsP quantum wells
3. Growth parameter optimization of short period ( < 50 Å) InGaAs/InP short period superlattices by chemical beam epitaxy for photonic devices
4. A reliable method of TEM cross section specimen preparation of YBCO films on various substrates
5. Control of growth temperature at the onset of In0.53Ga0.47As growth by chemical beam epitaxy
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1. Effect of growth interruption on the electrical and optical characteristics of InP/InGaAs HEMT structures;Microelectronic Engineering;2000-05
2. MOMBE selective infill growth of InP/GaInAs for quantum dot formation;Journal of Crystal Growth;2000-02
3. X-ray interference effect as a tool for the structural investigation of GaInAs/InP multiple quantum wells;Journal of Applied Physics;1998-04
4. Epitaxial layer morphology of highly strained GaInAs/InP multiple quantum well structures grown by CBE;Microelectronics Journal;1997-10
5. Effects of tensile strain and substrate off-orientation on the growth of multiple quantum well structures by CBE;Journal of Crystal Growth;1997-05
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