Critical thickness for growth of epitaxial grains in silicon film deposited on superlattice surface of silicon (111)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference14 articles.
1. A LEED STUDY OF THE HOMOEPITAXIAL GROWTH OF THICK SILICON FILMS
2. Structure analysis of Si(111)-7 × 7 reconstructed surface by transmission electron diffraction
3. Auger fine structures of surface states for Si(111)7 × 7 and
4. Observation of Initial Growth Stage of Amorphous Si Film Deposited on 7×7 Superlattice Surface of Si(111) by Low-Energy Electron Diffraction
5. Proc. 1st Intern. Conf. on Epitaxial Crystal Growth;Shigeta,1991
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Structural changes due to reannealing of Ge thin films prepared by solid phase epitaxial growth on Si (111) surface;Thin Solid Films;2020-09
2. Surface roughening induced by a characteristic surface structure of a Si film grown on Si(111);Surface Science;2001-06
3. Surface-roughening processes in GaAs MBE studied by in situ scanning electron microscopy;Journal of Crystal Growth;1998-06
4. A characteristic feature of crystalline thin-film growth of Si on a 7 × 7 superlattice surface of Si(111);Journal of Crystal Growth;1996-09
5. Roughening of the surface of an Si layer grown on an Si(111)-(7 × 7) superlattice;Surface Science;1996-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3