HBr-K2Cr2O7-H2O etching system for indium phosphide
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference19 articles.
1. Etching of III-V Semiconductors: An Electrochemical Approach;Notten,1991
2. Kinetics and Morphology of GaAs Etching in Aqueous CrO3 ‐ HF Solutions
3. Selective etching and photoetching of GaAs in CrO3-HF aqueous solutions
4. Chemical Etching Characteristics of ( 001 ) InP
5. Use of HBr ‐ CH 3 COOH ‐ K 2Cr2 O 7 Etchant to Etched‐Mirror Laser Fabrication
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