Growth of aluminium films by low pressure chemical vapour deposition using tritertiarybutylaluminium-Reference-Cited by-同舟云学术

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Growth of aluminium films by low pressure chemical vapour deposition using tritertiarybutylaluminium

Published:1994-01 Issue:1-2 Volume:135 Page:285-289
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Jones A.C.,Auld J.,Rushworth S.A.,Critchlow G.W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference26 articles.

1. Metal CVD for microelectronic applications: An examination of surface chemistry and kinetics

2. Vapor Phase Deposition of Aluminum Film on Quartz Substrate

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