In situ etching of GaAs using AsCl3 in MOVPE. I
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference12 articles.
1. SINGLE‐CRYSTAL GALLIUM ARSENIDE ON INSULATING SUBSTRATES
2. High purity GaAs prepared from trimethylgallium and arsine
3. A New Gas Etching Method for Vapor Growth of GaAs
4. The Effect of Chloride Etching on GaAs Epitaxy Using TMG and AsH3
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. In situ and selective area etching of GaN by tertiarybutylchloride (TBCl);Applied Physics Letters;2019-10-14
2. In situ reflectance monitoring of the growth and etching of AlAs/GaAs structures in MOVPE;Journal of Crystal Growth;2004-02
3. Etching of GaAs by CCl4 and VCl4 in a metalorganic vapor-phase epitaxy reactor;Journal of Crystal Growth;1998-12
4. In situ etching of GaAs by AsCl3 for regrowth on AlGaAs in metalorganic vapor-phase epitaxy;Journal of Crystal Growth;1998-12
5. Vapor etching of GaAs and AlGaAs by CH3I;Applied Physics Letters;1992-03-23
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3