Selective metalorganic chemical vapor deposition growth of GaAs on AlGaAs combined with in situ HCl gas etching
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference13 articles.
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1. High‐efficiency flexible III‐V photovoltaic solar cells based on single‐crystal‐like thin films directly grown on metallic tapes;Progress in Photovoltaics: Research and Applications;2018-08-06
2. In-situ etching of GaAs/AlxGa1−xAs by CBr4;Journal of Crystal Growth;2008-11
3. Influence of in situ HCl gas cleaning on n/p-type GaAs and AlGaAs regrown interfaces in MOCVD;Journal of Crystal Growth;2005-01
4. Observation of quasiperiodic faceting both on MOCVD-grown and on gas-etched surfaces of vicinal (110)GaAs substrates;Journal of Crystal Growth;1998-12
5. Time-Resolved Photoluminescence Study on a Hetero Interface Formed by Direct Regrowth of GaAs on anAl0.3Ga0.7AsSurface Prepared by an In Situ HCl Gas Etching Process;Japanese Journal of Applied Physics;1997-10-15
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