SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures-Reference-Cited by-同舟云学术

SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures

Published:1994-01 Issue:1 Volume:40 Page:63-70
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Shaw Kevin A.,Zhang Z.Lisa,MacDonald Noel C.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Pin joints, gears, springs, cranks, and other novel micromechanical structures;Fan;Proc. 4th Int. Conf. Solid-State Sensors and Actuators (Transducers '87), Tokyo, Japan,251987

2. Laterally driven polysilicon resonant microstructures;Tang;Sensors and Actuators,1989

3. Fabrication of micromechanical devices from polysilicon films with smooth surfaces;Guckel;Sensors and Actuators,1989

4. Review: surface micromachining;Linder;J. Micromech. Microeng.,1992

5. Silicon as a mechanical material;Peterson;Proc. IEEE,1982

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