A double-sided capacitive miniaturized accelerometer based on photovoltaic etch-stop technique-Reference-Cited by-同舟云学术

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A double-sided capacitive miniaturized accelerometer based on photovoltaic etch-stop technique

Published:1996-05 Issue:1-3 Volume:53 Page:261-266
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Lapadatu Daniel,De Cooman Michel,Puers Robert

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Capacitive silicon accelerometer with highly symmetrical design;Seidel;Sensors and Actuators,1990

2. A batch-fabricated silicon accelerometer;Roylance;IEEE Trans. Electron Devices,1979

3. A highly symmetrical capacitive micro-accelerometer with single degree-of-freedom response;Peeters;J. Micromech. Microeng.,1992

4. Anisotropic etching of crystalline silicon in alkaline solutions;Seidel;J. Electrochem. Soc.,1990

5. PHET, an electrodeless photovoltaic and electrochemical etchstop technique;Peeters;J. Microelectromech. Syst.,1994

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