Author:
Schmid G.H.S.,Eisenmenger-Sittner C.
Funder
Austrian Science Fund (FWF)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference38 articles.
1. Magnetron sputtering: a review of recent developments and applications
2. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
3. Magnetron sputtering – Milestones of 30 years
4. E. Takeshima, Process and apparatus for coating fine powders, United States Patent, Patent Number 4,940,523 (1990).
5. R. E. Toth, Apparatus and method of treating fine powders, United States Patent Application Publication, Pub. No. US 2006/0193978 A1 (2006).
Cited by
22 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献