HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis-Reference-Cited by-同舟云学术

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HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis

Published:2013-11 Issue: Volume:235 Page:714-719
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Surpi Alessandro,Kubart Tomas,Giordani Diego,Tosello Martino,Mattei Giovanni,Colasuonno Marino,Patelli Alessandro

Funder

European Union Cost Scientific Program on Highly Ionised Pulse Plasma Process

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference37 articles.

1. A novel pulsed magnetron sputter technique utilizing very high target power densities

2. High power impulse magnetron sputtering discharge

3. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

4. The surface science of titanium dioxide

5. The Oxide Handbook-IFI/Plenum New York;Samsonov,1973

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1. XANES and XRR study on phase evolution of TiO2 films developed using HiPIMS;Materials Science and Engineering: B;2022-09

2. High power impulse magnetron sputtering (HiPIMS) for the fabrication of antimicrobial and transparent TiO2 thin films;Current Opinion in Chemical Engineering;2022-06

3. Effect of target poisoning ratios on the fabrication of titanium oxide coatings using superimposed high power impulse and medium frequency magnetron sputtering;Surface and Coatings Technology;2021-09

4. Electrical transport properties of Ru Ti O2 films deposited by magnetron sputtering technique;Solid State Communications;2021-02

5. Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties;Coatings;2020-06-30

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