High power impulse magnetron sputtering (HiPIMS) for the fabrication of antimicrobial and transparent TiO2 thin films
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Published:2022-06
Issue:
Volume:36
Page:100782
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ISSN:2211-3398
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Container-title:Current Opinion in Chemical Engineering
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language:en
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Short-container-title:Current Opinion in Chemical Engineering
Author:
Lou Bih-Show,
Chen Wei-Ting,
Diyatmika WahyuORCID,
Lu Jong-Hong,
Chang Chen-Te,
Chen Po-Wen,
Lee Jyh-WeiORCID
Cited by
10 articles.
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