Deposition of hard carbon coatings using combined inductively and capacitively coupled plasma sources
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference13 articles.
1. Diamond deposition and plasma diagnostics in a 27 MHz inductive coupled reactor (ICP)
2. Inductively coupled r.f. plasma assisted chemical vapour deposition of diamond-like carbon coatings
3. Structure changes in a-C:H films in inductive CH4/Ar plasma deposition
4. Deposition of diamond-like carbon films using plasma source ion implantation with pulsed plasmas
5. Synthesis of diamond using a low pressure, radio frequency, inductively coupled plasma
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4. Controllable nitrogen incorporation in HfO2 films by modulating capacitively-combined inductively-coupled plasmas;Journal of Physics D: Applied Physics;2013-11-12
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