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Effect of plasma immersion ion implantation on the thermal stability of diffusion barrier layers

  • Published:2004-08 Issue:1-2 Volume:186 Page:77-81
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Kumar Mukesh,Rajkumar ,Raole P.M,Gupta S.K,Kumar Dinesh,George P.J

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-precision thickness regulation of graphene layers with low energy helium plasma implantation;Nanotechnology;2012-08-24

2. Effect of composition on electroless deposited Ni–Co–P alloy thin films as a diffusion barrier for copper metallization;Applied Surface Science;2012-08

3. Thermal stability of titanium nitride coatings prepared by the mixing technology with laser and plasma;Current Applied Physics;2012-01

4. Characterization of Pt oxide thin film fabricated by plasma immersion ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2005-08

5. Plasma Implantation;Wiley Encyclopedia of Electrical and Electronics Engineering;1999-12-27
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