Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference10 articles.
1. Titanium aluminum nitride films: A new alternative to TiN coatings
2. On structure and properties of sputtered Ti and Al based hard compound films
3. Properties of (Ti1−xAlx)N coatings for cutting tools prepared by the cathodic arc ion plating method
4. Formation and oxidation properties of (Ti1−xAlx)N thin films prepared by dc reactive sputtering
5. High temperature oxidation behaviour of (Ti1−xCrx)N coatings
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1. A comparative study between PVD-TiMgN and PVD-TiMgGdN sputtered coatings to evaluate the influence of Gd and its effect on the corrosion properties of the individual coatings;Surface and Coatings Technology;2023-12
2. Bulk Synthesis and Transport Properties of Rocksalt-Type Ti1–xMgxN Solid Solution;Inorganic Chemistry;2023-04-06
3. Experimental Synthesis of Theoretically Predicted Multivalent Ternary Nitride Materials;Chemistry of Materials;2022-02-01
4. Tunable Infrared Plasmonic Properties of Epitaxial Ti1–xMgxN(001) Layers;ACS Applied Materials & Interfaces;2021-05-05
5. Electronic structure, dynamic stability, elastic, and optical properties of MgTMN2 (TM = Ti, Zr, Hf) ternary nitrides from first-principles calculations;Journal of Applied Physics;2021-04-07
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