TiN/ZrN heterostructures deposition and characterisation-Reference-Cited by-同舟云学术

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TiN/ZrN heterostructures deposition and characterisation

Published:2006-06 Issue:22-23 Volume:200 Page:6505-6510
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Braic M.,Balaceanu M.,Vladescu A.,Kiss A.,Braic V.,Purice A.,Dinescu G.,Scarisoreanu N.,Stokker-Cheregi F.,Moldovan A.,Birjega R.,Dinescu M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference11 articles.

1. Multilayer coatings for improved performance

2. Growth, structural characterization and properties of hard and wear-protective layered materials

3. Tribological behaviour of multi-layered PVD nitride coatings

4. The search for novel, superhard materials

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Voltage stress induced interface states and hole trapping in germanium pMOSFETs with high-k gate dielectric and metal-gate electrode;Materials Science in Semiconductor Processing;2021-03

2. Interdiffusion behaviors observation in TiN/ZrO N bilayer by XAS and ToF-SIMS;Applied Surface Science;2020-10

3. In Vitro Corrosion of Titanium Nitride and Oxynitride-Based Biocompatible Coatings Deposited on Stainless Steel;Coatings;2020-07-22

4. Tribological Properties of Coatings Applied on Near-Nano and Nanostructured WC-Co Hardmetals by Using Plasma-Assisted Chemical Vapour Deposition Technique;Transactions of FAMENA;2020-05-06

5. Enhanced zirconia oxide dielectric quality of germanium p-channel metal oxide semiconductor field effect transistor by in-situ low temperature treatment in atomic layer deposition process;Thin Solid Films;2020-05

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