Deposition of tungsten disilicide films by DC magnetron sputtering at ultra-low operating pressure-Reference-Cited by-同舟云学术

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Deposition of tungsten disilicide films by DC magnetron sputtering at ultra-low operating pressure

Published:2021-09 Issue: Volume:422 Page:127501
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Shandrikov M.V.,Bugaev A.S.,Gushenets V.I.,Oks E.M.,Savkin K.P.,Vizir A.V.

Funder

Russian Foundation for Basic Research

Ministry of Science and Higher Education of the Russian Federation

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference47 articles.

1. Magnetron sputtering - milestones of 30 years;Bräuer;Vacuum.,2010

2. Magnetron sputtering: a review of recent developments and applications;Kelly;Vacuum.,2000

3. Magnetron sputtering;Swann;Phys. Technol.,1988

4. Sputter deposition processes;Depla,2010

5. Application of the magnetron sputtering for nanostructured electrocatalysts synthesis;Alexeeva;Intern. J. of hydrogen energy.,2016

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