Investigation of the amorphous to microcrystalline phase transition of thin film prepared by electron cyclotron resonance chemical vapor deposition method-Reference-Cited by-同舟云学术

Investigation of the amorphous to microcrystalline phase transition of thin film prepared by electron cyclotron resonance chemical vapor deposition method

Published:2013-09 Issue: Volume:231 Page:604-607
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Chang Teng-Hsiang,Chang Jenq-Yang,Chu Yen-Ho,Lee Chien-Chieh,Chen I-Chen,Li Tomi

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference16 articles.

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2. Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field

3. Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

4. Multi-dipolar plasmas for uniform processing: physics, design and performance

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