Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers-Reference-Cited by-同舟云学术

Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers

Published:2019-11 Issue: Volume:690 Page:137534
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Alvarez Hugo da S.^ORCID,Silva Audrey R.,Cioldin Frederico H.,Espindola Luana C.J.,Diniz José A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference48 articles.

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4. Semiconductors for Solar Cells;Möller,1993

5. Substitutional doping of amorphous silicon;Spear;Solid State Commun.,1975

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