Investigation of the microstructure and optical properties of Ge films grown by DC magnetron sputtering and in situ annealing-Reference-Cited by-同舟云学术

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Investigation of the microstructure and optical properties of Ge films grown by DC magnetron sputtering and in situ annealing

Published:2016-05-20 Issue:6 Volume:55 Page:061302
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Li Hui-Song,Qiu Feng,Xin Zheng-Hang,Wang Rong-Fei,Yang Jie,Zhang Jin,Wang Chong,Yang Yu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=6/a=061302/pdf

Reference44 articles.

1. High-performance Ge-on-Si photodetectors

2. Luminescence from Germanium and Germanium on Silicon

3. Strained-Germanium Nanostructures for Infrared Photonics

4. High responsivity near-infrared photodetectors in evaporated Ge-on-Si

5. High performance germanium-on-silicon detectors for optical communications

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Studies on B-doping during low-temperature growth of nc-Ge thin films via PECVD to mitigate unwanted conduction characteristics from the post-deposition oxygen absorption;Solar Energy Materials and Solar Cells;2024-09

2. Interface characteristics of InP/Si heterojunction fabricated by low-temperature wafer bonding based on microcrystalline Ge interlayer;Vacuum;2024-05

3. High-quality Ge/Si hetero-bonding by sputtered microcrystalline Ge interlayer;Vacuum;2023-08

4. Effect of Substrate Biasing on the Epitaxial Growth and Structural Properties of RF Magnetron Sputtered Germanium Buffer Layer on Silicon;Coatings;2021-09-02

5. Microcrystal-Induced Crystallization Effect for High-Quality Germanium/Silicon Heteroepitaxial Nanofilms;ACS Applied Electronic Materials;2021-08-10

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