Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing-Reference-Cited by-同舟云学术

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Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing

Published:2008-08 Issue:22-23 Volume:202 Page:5242-5245
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kim Kyong Nam,Lim Jong Hyeuk,Park Jung Kyun,Yeom Geun Young

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference11 articles.

1. Glow discharge processing in the liquid crystal display industry

2. Inductively coupled plasmas: Optimizing the inductive-coupling efficiency for large-area source design

3. Review of inductively coupled plasmas for plasma processing

4. Review of heating mechanism in inductively coupled plasma

5. Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dry Etching;Handbook of Visual Display Technology;2016

2. Dry Etching;Handbook of Visual Display Technology;2015

3. Linear Plasma Sources for Large Area Film Deposition: A Brief Review;Plasma Science and Technology;2014-04

4. Dry Etching;2012

5. Dry Etching;Handbook of Visual Display Technology;2012

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