Dry Etching
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-540-79567-4_60.pdf
Reference28 articles.
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3. Abe H, Yoneda M, Fujiwara N (2008) Developments of plasma etching technology for fabricating semiconductor devices. Jpn J Appl Phys 47:1435–1455
4. Schmitt J, Elyaakoubi M, Sansonnens L (2002) Glow discharge processing in the liquid crystal display industry. Plasma Sources Sci Technol 11:A206–A210
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