Iodine-catalyzed chemical vapor deposition of Cu on MPTMS monolayer surface in a low deposition temperature regime-Reference-Cited by-同舟云学术

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Iodine-catalyzed chemical vapor deposition of Cu on MPTMS monolayer surface in a low deposition temperature regime

Published:2007-09 Issue:22-23 Volume:201 Page:9432-9436
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Park H.J.,Shin H.J.,Jung H.S.,Kim C.,Sung M.M.,Lee C.M.,Soh H.S.,Lee J.G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference16 articles.

1. Chemical Vapor Deposition of Copper from Hexafluoroacetylacetonato Copper(I) Vinyltrimethylsilane: Deposition Rates, Mechanism, Selectivity, Morphology, and Resistivity as a Function of Temperature and Pressure

2. Advanced multilayer metallization schemes with copper as interconnection metal

3. Multilevel interconnections for ULSI and GSI era

4. Proc. of the 3rd International Meeting on Information Display;Park,2003

5. Proc. of the 4th International Meeting on Information Display;Choi,2004

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metals – Gas-Phase Deposition and Applications;Comprehensive Inorganic Chemistry II;2013

2. Alkoxysilane Layers Compatible with Copper Deposition for Advanced Semiconductor Device Applications;Langmuir;2010-02-26

3. Alkoxysilane layers deposited by SC CO2 process on silicon oxide for microelectronics applications;The Journal of Supercritical Fluids;2009-12

4. Formation of Cu nanocrystals on 3-mercaptopropyltrimethoxysilane monolayer by pulsed iodine-assisted chemical vapor deposition for nonvolatile memory applications;Applied Physics Letters;2009-05-25

5. Effects of iodine on the initial growth of MOCVD Cu on MPTMS monolayer surface at a low temperature of 110 °C;Thin Solid Films;2009-05

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