A study of the phase transformation of low temperature deposited tantalum thin films using high power impulse magnetron sputtering and pulsed DC magnetron sputtering

Author:

Chen Wei-Chieh,Wang Zhao-Ying,Yu Chiao-Yi,Liao Bo-Huei,Lin Ming-Tzer

Funder

MOST

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference22 articles.

1. Evaluation of residual stress in sputtered tantalum thin-film;Clevenger;J. Appl. Phys.,1992

2. Effect of sputter pressure on Ta thin films: beta phase formation, texture, andstresses;Ellis;Acta Mater.,2018

3. Hardness enhancement in nanocrystalline tantalum thin films;Zhang;Scr. Mater.,2006

4. Texture and phase transformation of sputter-deposited metastable Ta films and Ta/Cu multilayers;Hoogeveen,1996

5. Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering;Alami;Thin Solid Films,2007

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