Substrate rotation-induced chemical modulation in Ti-Al-O-N coatings synthesized by cathodic arc in an industrial deposition plant-Reference-Cited by-同舟云学术

Substrate rotation-induced chemical modulation in Ti-Al-O-N coatings synthesized by cathodic arc in an industrial deposition plant

Published:2016-11 Issue: Volume:305 Page:249-253
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hans Marcus^ORCID,to Baben Moritz,Chen Yen-Ting,Pradeep Konda G.,Holzapfel Damian M.,Primetzhofer Daniel,Kurapov Denis,Ramm Jürgen,Arndt Mirjam,Rudigier Helmut,Schneider Jochen M.

Funder

German Research Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

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