Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference34 articles.
1. M. Auwärter, Balzers AG, Austrian Pat. No. 192 650 (1952), USA Pat. No. 2.920.002 (1960), FRG Pat. No. 1.104.283 (1968), and in many other countries.
2. D.S. Brinsmaid et al., Kodak, USA Pat. No. 2.784.115 (1957), application made on May 4, 1953.
3. Reactive Evaporation in Ionized Gases
4. Activated Reactive Evaporation Process for High Rate Deposition of Compounds
5. Ion-beam-assisted deposition of thin films
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