Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study-Reference-Cited by-同舟云学术

Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study

Published:2020 Issue:3 Volume:12 Page:2089-2102
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Beladiya Vivek¹²³⁴^ORCID,Becker Martin⁵²⁶⁴,Faraz Tahsin⁷⁸⁹¹⁰^ORCID,Kessels W. M. M. (Erwin)⁷⁸⁹¹⁰^ORCID,Schenk Paul¹²³⁴¹¹,Otto Felix¹²²⁶⁴^ORCID,Fritz Torsten¹²²⁶⁴^ORCID,Gruenewald Marco¹²²⁶⁴^ORCID,Helbing Christian¹³⁵²⁶⁴,Jandt Klaus D.¹³⁵²⁶⁴^ORCID,Tünnermann Andreas¹²³⁴¹¹,Sierka Marek⁵²⁶⁴^ORCID,Szeghalmi Adriana¹²³⁴¹¹^ORCID

Affiliation:

1. Institute of Applied Physics

2. Friedrich Schiller University Jena

3. 07745 Jena

4. Germany

5. Otto Schott Institute of Materials Research

6. 07743 Jena

7. Department of Applied Physics

8. University of Technology Eindhoven

9. Eindhoven

10. The Netherlands

11. Fraunhofer Institute for Applied Optics and Precision Engineering IOF

12. Institute of Solid State Physics

13. Chair of Materials Science (CMS)

Abstract

PEALD of thin SiO₂ films assisted by bias is a powerful technique to tailor their physical and chemical properties.

Funder

Deutsche Forschungsgemeinschaft

Fraunhofer-Gesellschaft

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/C9NR07202K

Reference94 articles.

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2. J. Foggiato , in Handbook of Thin Film Deposition Processes and Techniques , ed. K. Seshan , William Andrew Publishing , Norwich, NY , 2nd edn, 2001 , ch. 3, pp. 111–150

3. Plasma deposition of optical films and coatings: A review

4. N. Kaiser and H. K.Pulker , Optical interference coatings , 2003

5. Antireflection coating design for plastic optics

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