Hydrogen microwave plasma treatment of Si and SiO2
Author:
Funder
Fraunhofer Association
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference17 articles.
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3. Removal efficiency of organic contaminants using ECR H2 plasma and ECR O2 plasma;Choi;J. Korean Phys. Soc.,2003
4. The role of atomic hydrogen in pre-epitaxial silicon substrate cleaning;Aßmuth;Appl. Surf. Sci.,2007
5. Etching characteristics of Si and SiO2 with a low energy argon/hydrogen d.c. plasma source;Strass;Surf. Coat. Technol.,1997
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