Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH 4 plasma chemical vapor deposition
Author:
Funder
NEDO
PVTEC
JSPS
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference32 articles.
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5. Hysteresis and mode transitions in a low-frequency inductively coupled plasma;Xu;J. Vac. Sci. Technol. A,2000
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