Silicon carbonitride thin films deposited by reactive high power impulse magnetron sputtering
Author:
Funder
European Union
Swedish Government
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
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5. Structural and optical investigations of silicon carbon nitride thin films deposited by magnetron sputtering;Tomasella;Plasma Process. Polym.,2009
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