Structural and Optical Investigations of Silicon Carbon Nitride Thin Films Deposited by Magnetron Sputtering-Reference-Cited by-同舟云学术

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Structural and Optical Investigations of Silicon Carbon Nitride Thin Films Deposited by Magnetron Sputtering

Published:2009-06 Issue:S1 Volume:6 Page:S11-S16
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes Polym.

Author:

Tomasella Eric,Spinelle Laurent,Bousquet Angélique,Rebib Farida,Dubois Marc,Eypert Céline,Gaston Jean Paul,Cellier Joel,Sauvage Thierry

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.200930103/fullpdf

Reference24 articles.

1. Nanocrystalline silicon carbonitride thin films prepared by plasma beam-assisted deposition

2. Structure and elastic properties of amorphous silicon carbon nitride films

3. Piezoreflectance study of silicon carbon nitride nanorods

4. Reactive magnetron sputtering of Si–C–N films with controlled mechanical and optical properties

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