High resolution lithography using synchrotron radiation-Reference-Cited by-同舟云学术

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High resolution lithography using synchrotron radiation

Published:1986-05 Issue:1-3 Volume:246 Page:658-667
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Betz H.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference11 articles.

1. S. Conf. Elec., Ion Beam Sci. Tech.;Smith,1980

2. ESSDERC-Meeting, Sol. St. Devices;Heuberger,1982

3. Brookhaven Con.;Heuberger,1983

4. Proc. 29th Int. Symp. on Electron, Ion and Photon Beams;Okada,1985

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recirculating Electron Accelerators with Noncircular Electron Orbits as Radiation Sources for Applications (a Review);Physics of Particles and Nuclei;2018-05

2. High-purity silicon soft x-ray imaging sensor array;Sensors and Actuators A: Physical;1990-06

3. Optimization of a synchrotron based x‐ray lithographic system;Review of Scientific Instruments;1989-07

4. The effect of beam emittances on x‐ray lithography exposure line resolution;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1987-07

5. X-ray lithography and storage rings;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1986-05

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