Author:
So D.,Lai B.,Wells G. M.,Cerrina F.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
12 articles.
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1. Engineering study of extreme ultraviolet interferometric lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-04-01
2. Evaluation of Effective Image Blurring Factors in the Synchrotron Proximity X-Ray Lithography;Japanese Journal of Applied Physics;2000-12-30
3. Aspheric collimator for a point source x-ray lithography system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11
4. Novel single mirror condenser for x-ray lithography beam lines;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
5. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08