Some properties of zirconium nitride formed by plasmas
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference7 articles.
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1. Formation of hBN monolayers through nitridation of epitaxial silicene on diboride thin films;Journal of Applied Physics;2019-10-07
2. Material properties of ZrN film on silicon prepared by low-energy ion-assisted deposition;Surface and Coatings Technology;1994-08
3. Material properties of a ZrNx film on silicon prepared by ion‐assisted deposition method;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-09
4. Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films;Chemistry of Materials;1991-11-01
5. Properties of ZrN x prepared by ion-assisted deposition;Journal of Materials Science Letters;1990-08
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