Material properties of ZrN film on silicon prepared by low-energy ion-assisted deposition-Reference-Cited by-同舟云学术

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Material properties of ZrN film on silicon prepared by low-energy ion-assisted deposition

Published:1994-08 Issue:1-3 Volume:66 Page:318-322
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Horita Susumu,Kobayashi Mituru,Akahori Hiroshi,Hata Tomonobu

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference15 articles.

1. Some properties of zirconium nitride formed by plasmas

2. Properties of Superconducting ZrN Thin Films Deposited by dc Reactive Magnetron Sputtering

3. ZrN diffusion barrier in aluminum metallization schemes

4. A comparative study of the diffusion barrier properties of TiN and ZrN

5. A New Mechanism of Failure in Silicon p+/n Junction Induced by Diffusion Barrier Metals

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1. MOCVD growth of ZrN thin films on GaN/Si templates and the effect of substrate temperature on growth mode, stress state, and electrical properties;Journal of Physics D: Applied Physics;2022-08-02

2. Effect of coating architecture on stress and energy relief efficiency of TiZrN coating on Si substrate;Thin Solid Films;2022-06

3. Microstructure, properties and applications of Zr-carbide, Zr-nitride and Zr-carbonitride coatings: a review;Materials Advances;2020

4. The effect of deposition conditions on the properties of Zr-carbide, Zr-nitride and Zr-carbonitride coatings – a review;Materials Advances;2020

5. Optimization and Contact Reliability of TiN-Coated Microswitches in Various Gas Environments;Journal of Microelectromechanical Systems;2019-02

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