Nitriding of zirconium in a radio frequency discharge
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference16 articles.
1. The reaction between tantalum and nitrogen at 800–1300°c
2. A Film-Thickness Determination of Nitrogen Diffusion in Zirconium Nitride
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3. Surface Modification by Cold Plasma;Film Deposition by Plasma Techniques;1992
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