Formation of tantalum oxide by chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference12 articles.
1. Deposition of Tantalum and Tantalum Oxide by Superimposed RF and D -C Sputtering
2. Reactively Sputtered Oxide Films
3. Investigation of Si-Ta2O5System Prepared by Reactive Sputtering
4. Selected Properties of Pyrolytic Ta[sub 2]O[sub 5] Films
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3. Halide chemical vapour deposition of Ta2O5;Thin Solid Films;1999-04
4. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications;Materials Science and Engineering: R: Reports;1998-05
5. Effects of Temperature and Reagent Concentration on the Morphology of Chemically Vapor Deposited β-Ta2O5;Journal of the American Ceramic Society;1995-05
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