Effects of Temperature and Reagent Concentration on the Morphology of Chemically Vapor Deposited β-Ta2O5
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1995.tb08485.x/fullpdf
Reference11 articles.
1. Corrosion of Silicon-Based Ceramics in Combustion Environments;Jacobson;J. Am. Ceram. Soc.,1993
2. W. Y. Lee Y. W. Bae D. P. Stinton T. E. Strangman Na 2 SO 4 Induced Corrosion of Si 3 N 4 Coated with Chemically Vapor Deposited Ta 2 O 5 submitted to J. Am. Ceram. Soc
3. Ellipsometric Examination of Growth and Dissolution Rates of Ta2O5 Films Formed by Metalorganic Chemical Vapor Deposition;An;J. Electrochem. Soc.,1992
4. Preparation and Properties of Ta2O5 Films by LPCVD for ULSI Application;Zaima;J. Electrochem. Soc.,1990
5. Chemical Vapor Deposition of Tantalum Pentoxide Films for Metal-Insulator-Semiconductor Devices;Kaplan;J. Electrochem. Soc.,1976
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