Nanocrystalline p-type silicon films produced by hot wire plasma assisted technique
Author:
Publisher
Elsevier BV
Subject
Biomaterials,Bioengineering,Mechanics of Materials
Reference10 articles.
1. Microcrystalline Silicon n-i-p Solar Cells Deposited Entirely by the Hot-Wire Chemical Vapor Deposition Technique
2. Hot-Wire CVD Poly-Silicon Films for Thin Film Devices
3. The Effect of Hydrogen Dilution on Hot-Wire Thin-Film Transistors
4. Efficient Boron Incorporation in Hydrogenated Amorphous Silicon Films by a Novel Combination of RF Glow Discharge Technique and Heated Filament
5. Role of the hot wire filament temperature on the structure and morphology of the nanocrystalline silicon p-doped films
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Roles of hydrogen dilution on the microstructural and optoelectronic properties of B-doped nanocrystalline Si:H thin films;Journal of Applied Physics;2004-04-15
2. Effects of high hydrogen dilution on the optical and electrical properties in B-doped nc-Si:H thin films;Journal of Crystal Growth;2004-01
3. Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique;Key Engineering Materials;2002-10
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