Electrical characterization of ONO triple dielectric in SONOS nonvolatile memory devices

Author:

Bu Jiankang,White Marvin H

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Space charge distribution limitation on scaled down of MNOS memory devices;Hampton;IEDM Dig,1979

2. Formation of 20–25 A thermal oxide films on silicon at 950°–1140°C;Aboaf;J Electrochem Soc,1971

3. Thermal oxidation of silicon in various oxygen partial pressures dilluted by nitrogen;Kamigaki;J Appl Phys,1977

4. Study of thin gate oxides grown in an ultra-dry/clean-triple-wall oxidation furnace system;Yoon;J Electron Mater,1990

5. Structure analysis of silicon dioxide films formed by oxidation of silane;Nagasima;J Appl Phys,1972

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